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Scholarly Output
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Development of reactive ion etching process for deep etching of silicon for micro-mixer device fabrication
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Development of reactive ion etching process for deep etching of silicon for micro-mixer device fabrication
Journal
DTIP 2014 - Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS
Date Issued
2014-03-09
Author(s)
Dhanekar, Saakshi
Tiwari, Ruchi
Behera, Bhagaban
Chandra, Sudhir
Balasubramaniam, R.
Subjects
Deep channel | microf...