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  1. Home
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  4. Performance Investigation of Universal Gates and Ring Oscillator using Doping-free Bipolar Junction Transistor
 
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Performance Investigation of Universal Gates and Ring Oscillator using Doping-free Bipolar Junction Transistor

Date Issued
2020-06-01
Author(s)
Sahu, Abhishek
Kumar, Abhishek
Tiwari, Shree Prakash
DOI
10.1109/SNW50361.2020.9131668
Abstract
Performance of symmetric lateral doping-free bipolar junction transistor (BJT) on silicon on insulator (SOI) in universal gates and ring oscillator were investigated. Charge carriers in SOI at emitter and collector regions are induced with two unique approaches, i.e., the charge plasma (CP) and polarity control (PC). Four types of devices (CP-NPN, CP-PNP, PC-NPN, and PC-PNP) was used for bipolar CMOS type NAND and NOR gates. Excellent transient response with rise and fall time less than 5 ns and propagation delay less than 2.4 ns were obtained.
Subjects
  • Charge plasma (CP)

  • doping free BJT

  • polarity control (PC)...

  • TCAD simulation recon...

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