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Designing 0.5 v 5-nm HP and 0.23 v 5-nm LP NC-FinFETs with Improved I<inf>OFF</inf> Sensitivity in Presence of Parasitic Capacitance
Journal
IEEE Transactions on Electron Devices
Date Issued
2018-03-01
Author(s)
Kushwaha, Pragya
Duarte, Juan Pablo
Lin, Yen Kai
Sachid, Angada B.
Chang, Huan Lin
Salahuddin, Sayeef
Hu, Chenming
Subjects