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  1. Home
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  4. Solution Processed High-k/Low-k Bilayer Gate Dielectrics for Flexible Organic Transistors
 
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Solution Processed High-k/Low-k Bilayer Gate Dielectrics for Flexible Organic Transistors

Date Issued
2022-01-01
Author(s)
Rahi, Sachin
Konwar, Gargi
Tiwari, Shree Prakash
DOI
10.1109/ICEE56203.2022.10117578
Abstract
In this paper, a bi-layer combination of high-k/low-k gate dielectric consisting of poly (vinyl alcohol) (PVA) and poly (4-vinylphenol-co-methyl methacrylate) (PVP-Co-PMMA) polymers was explored to fabricate high performance flexible organic transistors. Solution processed TIPS-Pentacene: polystyrene (PS) was used to demonstrate p-channel transistors with excellent electrical characteristics. These devices exhibited average and maximum field-effect mobility (μ) values of 0.2 (±0.1) cm^2/Vs and 0.5 cm^2/V s in the saturation regime with high current (Ion/Ioff) ratio of 10^4 at an operating voltage of -8 V, with negligible hysteresis in transfer curves. Moreover, excellent repeatability in electrical characteristics with high cyclic and bias stress stability were also achieved. These findings suggest that this unique bi-layer gate dielectric combination can act as an excellent alternative for solution processed organic transistors.
Subjects
  • cyclic stability

  • flexible electronics

  • High-k/Low-k

  • negligible hysteresis...

  • organic transistor

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